FAB 中曝光機 (scanner) 的市佔率 - 工程師
By Una
at 2017-03-10T22:37
at 2017-03-10T22:37
Table of Contents
想請問在黃光區的先進問題
一說到曝光機台廠商,原本都只想到 ASML
尤其是在先進製程上,下一代 EUV 大概也得靠他們
不過最近好奇看 NIKON 193i 的機台,才發現性能和 ASML 差不多
以下是兩家最新的193i機台比較:
ASML NXT:1980Di NIKON NSR-S631E
NA 0.85-1.35 1.35
Resolution ≦38nm ≦38nm
Field size 26*33 mm 26*33 mm
Overlay
(Single machine) ≦1.6 nm ≦1.7 nm
(Matched machine) ≦2.5 nm ≦2.3 nm
Throughput(96 shots) ≧275 WPH ≧270 (optional) WPH
Ref:
http://www.nikon.com/products/semi/lineup/pdf/NSR-S631E_e.pdf
https://goo.gl/EhfIsL
請問在業界這兩台都有人在用嗎?
還是先進製程主要仍以 ASML 居多? (N家幾乎都日本半導體廠自用?)
--
一說到曝光機台廠商,原本都只想到 ASML
尤其是在先進製程上,下一代 EUV 大概也得靠他們
不過最近好奇看 NIKON 193i 的機台,才發現性能和 ASML 差不多
以下是兩家最新的193i機台比較:
ASML NXT:1980Di NIKON NSR-S631E
NA 0.85-1.35 1.35
Resolution ≦38nm ≦38nm
Field size 26*33 mm 26*33 mm
Overlay
(Single machine) ≦1.6 nm ≦1.7 nm
(Matched machine) ≦2.5 nm ≦2.3 nm
Throughput(96 shots) ≧275 WPH ≧270 (optional) WPH
Ref:
http://www.nikon.com/products/semi/lineup/pdf/NSR-S631E_e.pdf
https://goo.gl/EhfIsL
請問在業界這兩台都有人在用嗎?
還是先進製程主要仍以 ASML 居多? (N家幾乎都日本半導體廠自用?)
--
Tags:
工程師
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