三星正式宣布量產GAA架構3奈米晶片 - 工程師
By Oliver
at 2022-06-30T11:30
at 2022-06-30T11:30
Table of Contents
https://news.cnyes.com/news/id/4904463
鉅亨網編譯羅昀玫
三星電子週四 (30 日) 正式宣布量產 GAA 架構的 3 奈米製程,成為全球第一家量產 3
奈米製程的晶圓代工廠商,但並未公布首發客戶名單。
三星最新聲明中指出,三星在 3 奈米製程節點中導入 GAA 架構,以突破 FinFET 架構性
能限制,這個新世代製程通過降低電源電壓來提高功率效率,同時通過增加驅動電流能力
來提高性能,能以更小的體積實現更好的功耗表現,以滿足各種客戶的需求。
三星稱,GAA 的設計靈活性非常有利於設計技術協同優化 (DTCO),與 5 奈米製程工藝相
比,第一代 3 奈米製程可將功耗降低 45%、性能提高 23%,晶片面積減少多達 16%,而
第二代 3 奈米製程可降低高達 50% 的功耗,提高 30% 的性能和減少 35% 的面積。
三星電子總裁暨晶圓代工事業部負責人 Siyoung Choi 表示,三星在晶圓代工行業的首個
高介電常數金屬閘極 (HKMG)、FinFET、EUV 等新一代技術應用於製造業方面,一直保持
著領先地位,公司尋求持續在全球首個 MBCFET™ 3 奈米製程方面的領導地位,將在競爭
性技術開發方面繼續積極創新,並建立有助於加速實現技術成熟的流程。
三星並未公布首發客戶名單,但市場傳出三星 3 奈米製程最初客戶有上海磐矽半導體
(PanSemi) 和高通 (QCOM-US) 等公司。
--
鉅亨網編譯羅昀玫
三星電子週四 (30 日) 正式宣布量產 GAA 架構的 3 奈米製程,成為全球第一家量產 3
奈米製程的晶圓代工廠商,但並未公布首發客戶名單。
三星最新聲明中指出,三星在 3 奈米製程節點中導入 GAA 架構,以突破 FinFET 架構性
能限制,這個新世代製程通過降低電源電壓來提高功率效率,同時通過增加驅動電流能力
來提高性能,能以更小的體積實現更好的功耗表現,以滿足各種客戶的需求。
三星稱,GAA 的設計靈活性非常有利於設計技術協同優化 (DTCO),與 5 奈米製程工藝相
比,第一代 3 奈米製程可將功耗降低 45%、性能提高 23%,晶片面積減少多達 16%,而
第二代 3 奈米製程可降低高達 50% 的功耗,提高 30% 的性能和減少 35% 的面積。
三星電子總裁暨晶圓代工事業部負責人 Siyoung Choi 表示,三星在晶圓代工行業的首個
高介電常數金屬閘極 (HKMG)、FinFET、EUV 等新一代技術應用於製造業方面,一直保持
著領先地位,公司尋求持續在全球首個 MBCFET™ 3 奈米製程方面的領導地位,將在競爭
性技術開發方面繼續積極創新,並建立有助於加速實現技術成熟的流程。
三星並未公布首發客戶名單,但市場傳出三星 3 奈米製程最初客戶有上海磐矽半導體
(PanSemi) 和高通 (QCOM-US) 等公司。
--
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